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P03200 - SEMI P32 - Test Method for Determination of Trace Metals in Photoresist StdPbc-0822 SEMI M52は,走査型表面検査システム(SSISs: scanning surface inspection

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Description

SEMI M52は,走査型表面検査システム(SSISs: scanning surface inspection systems)の校正のため,認証された標準試料(CRMs: certified reference materials)の使用を要求している。校正方法は,SEMI M53で規定されている。本テスト法は,差分移動度解析器(DMA: differential mobility analyzer)を用いた特定のパーティクル堆積システムが,要求されているCMRsを制作出来るか否かを決定する手順を提供する。

The purpose of the Wafer ID Reader Functional Standard is to provide a common specification for concepts

本スタンダードは,global Information & Control Technical Committeeで技術的に承認されている。現版は2011年12月24日,global Audits and Reviews Subcommitteeにて発行が承認された。2012年2月にwww

This Standard was technically approved by the global MEMS/NEMS Committee

SEMI E125-1022 (technical revision)

P03200 - SEMI P32 - Test Method for Determination of Trace Metals in Photoresist StdPbc-0822 SEMI M52は,走査型表面検査システム(SSISs: scanning surface inspectionThis test method was technically approved by the Global Micropatterning Committee and is the direct responsibility of the Japanese Micropatterning Committee. Current edition approved by the Japanese Regional Standards Committee on July 23, 2004. Initially available at www. semi. org August 2004; to be published November 2004. Originally published September 1998. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to

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